Circular Ion Sources for Plasma Enhanced Atomic Layer Deposition Applications

Konferenzbeitrag › Konferenzpaper › 2015

Zitation

Ngo, Ha Duong; Bellido-Gonzalez, Victor; Monaghan, D.; Daniel, B.; Li, H.; Papa, F.; Kroehnert, K.; Ehrmann, Oswin; Lang, Klaus-Dieter; Mackowiak, Piotr: Circular Ion Sources for Plasma Enhanced Atomic Layer Deposition Applications. In: 58th Annual Technical Conference Proceedings. Hg. von SVC Vacuum Technologies. Santa Clara: 2015, S. 1040-1051.

ISSN

0737-5921

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