Plasma Enhanced Atomic Layer Deposition by means of an Anode Layer Ion Source for Electronics Packaging Applications
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Ngo, Ha Duong; Bellido-Gonzalez, Victor; Monaghan, D.; Daniel, B.; Li, H.; Papa, F.; Kroehnert, K.; Ehrmann, Oswin; Lang, Klaus-Dieter; Mackowiak, Piotr: Plasma Enhanced Atomic Layer Deposition by means of an Anode Layer Ion Source for Electronics Packaging Applications. In: Proceedings of the 17th Electronics Packaging Technology Conference. Hg. von IEEE. Singapur: 2015, S. 204-208.
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Plasma Enhanced Atomic Layer Deposition by means of an Anode Layer Ion Source for Electronics Packaging Applications
EPTC
Singapure, 02.12.2015Veranstaltungsbeitrag › Vortrag › 2015