Effect of wet-chemical substrate smoothing on passivation of ultrathin-SiO2/n-Si(111) interfaces prepared with atomic oxygen at thermal impact energies

Artikel › Journalartikel › 2011

Zitation

Angermann, Heike; Gref, Orman; Stegemann, Bert: Effect of wet-chemical substrate smoothing on passivation of ultrathin-SiO2/n-Si(111) interfaces prepared with atomic oxygen at thermal impact energies. In: Central European Journal of Physics 9, 6. (2011), S. 1472-1481.

ISSN

1895-1082 (print version), 1644-3608 (electronic version)

Link

http://dx.doi.org/10.2478/s11534-011-0053-0

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