The growth of microcrystalline silicon oxide thin films studied by in situ plasma diagnostics

Artikel › Journalartikel › 2013

Zitation

Kirner, Simon; Gabriel, Onno; Stannowski, Bernd; Rech, Bernd; Schlatmann, Rutger: The growth of microcrystalline silicon oxide thin films studied by in situ plasma diagnostics. In: Applied Physics Letters Volume 102, 5. (2013), S. 051906-051906-4.

ISSN

0003-6951

Link

http://dx.doi.org/10.1063/1.4790279

Zitieren

BibTeX / RIS