Plasma enhanced chemical vapor deposition process optimization for thin film silicon tandem junction solar cells

Artikel › Journalartikel › 2014

Zitation

Rohde, Martin; Zelt, Matthias; Gabriel, Onno; Neubert, Sebastian; Kirner, Simon; Severin, Daniel; Stolley, Tobias; Rau, Björn; Stannowski, Bernd; Schlatmann, Rutger: Plasma enhanced chemical vapor deposition process optimization for thin film silicon tandem junction solar cells. In: Thin Solid Films Volume 558. (2014), S. 337–343.

ISSN

0040-6090

Link

http://dx.doi.org/10.1016/j.tsf.2014.03.008

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