A model of the passivation of ultrathin SiO2 layer / Si substrate interfaces by atomic hydrogen from a thermalised plasma source

Veranstaltungsbeitrag › Posterpräsentation › 2009

Veranstaltung

Spring-Meeting of European Materials Research Society (EMRS09), Symposium H: Synthesis, processing and characterization of nanoscale multi functional oxide films
Strassbourg, France, 08.06.2009 - 12.06.2009

Ergänzende Angaben

Poster A. Sarikov, B. Stegemann, M. Schmidt

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